Temperature control in etching process is important for semiconductor manufacturing technology. However. pressure variations in vacuum chamber results in a change in temperature. worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. https://www.roneverhart.com/2018-NISSAN-SENTRA-Windshield-Wiper-Arm-with-Blade-Frameless-Pair-Left-and-Right/